High N.A. UV Micro Objectives

Special Optics High N.A. focusing objectives have some of the highest numerical aperture designs in the optical industry. Designs achieving 0.50N.A., 0.75N.A. and 0.90 N.A. are available for a variety of material processing and laser micromachining applications that use high powered UV lasers.

Built with a diffraction limited design our objectives allow laser micromachining processes such as cutting, drilling, writing and hole-shaping to be performed with the highest accuracy, and can eliminate any cemented surfaces that would limit the usable power.

Our achromatic focusing objectives  are aberration corrected at two wavelengths simultaneously.  The achromatic design ensures that the optical  system is fully corrected at both 248nm and 365nm. All the objective surfaces are AR coated (anti-reflective).

Specifications:			Features
Wavefront Distortion	< 1/4 Wave		Diffraction Limited Design Air-Spaced for High Power Applications Achromatic Design
Transmission	> 97%
Coating Damage Threshold	500 MW/cm2
Surface Quality	20-10

Please replace λ in model number with working wavelength when ordering.